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Jul 9, 2023

Advanced masking technology enables new applications for metasurface optics

Posted by in category: futurism

Optics researchers at Lawrence Livermore National Laboratory (LLNL) have refined their novel metasurface process to create taller features without increasing feature-to-feature spacing, an advance that unlocks exciting new design possibilities.

“We have refined our process to create metasurfaces that allow for a wide optical bandwidth and a large span of incidence angles for an antireflection layer,” said LLNL research scientist Eyal Feigenbaum, the principal investigator. “We can now cover bandwidth range all the way from the ultraviolet to wavelengths larger than 2 microns, which is extraordinary. That wasn’t possible with the existing technology.”

The result is reported in a new paper, “All-Glass Metasurfaces for Ultra-Broadband and Large Acceptance Angle Antireflectivity: from Ultraviolet to Mid-Infrared.” It will be the cover story for the December 2023 issue of Advanced Optical Materials.

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